Department of Electronics Engineering, Kamla Nehru Institute of Technology, Sultanpur – 228118, India.
World Journal of Advanced Research and Reviews, 2026, 31(01), 108–115
Article DOI: 10.30574/wjarr.2026.31.1.1812
Received on 25 May 2026; revised on 30 June 2026; accepted on 02 July 2026
The Double-Gate FinFET technique is proposed in this work for the implementation of a CMOS 4:2 compressor. The main objective of this study is to reduce leakage power and leakage current while maintaining comparable performance with fewer transistors. This paper presents a high-performance CMOS 4:2 compressor based on an optimized logic architecture. The proposed Double-Gate FinFET approach reduces process variation effects in CMOS 4:2 compressor circuits, mainly by decreasing leakage power and delay. Double-Gate FinFET technology is suitable for logic cells because it provides improved speed, lower threshold-voltage operation, reduced leakage, and enhanced performance. The proposed CMOS 4:2 compressor design was simulated using Cadence Virtuoso at 90 nm technology.
CMOS; 4:2 Compressor; Leakage Power; Power Delay Product; Delay; Cadence Virtuoso; DG-FinFET
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Pallavi Singh and Prof Harsh Vikram singh. Implementation of energy-efficient low-power CMOS 4:2 compressor using DG FinFET technique. World Journal of Advanced Research and Reviews, 2026, 31(01), 108–115. Article DOI: https://doi.org/10.30574/wjarr.2026.31.1.1812